A SIS bath, also known as a Solvent-in-Silicone bath, is a specialized cleaning method used in the semiconductor industry. It involves immersing semiconductor wafers in a bath containing a solvent dissolved in silicone oil. This process removes contaminants and particles from the wafer surface without damaging the delicate structures.
How SIS Baths Work:
- Solvent: The solvent in the bath is typically a strong cleaning agent that dissolves contaminants like organic residues, metal ions, and particles.
- Silicone Oil: The silicone oil acts as a carrier for the solvent, providing a stable and controlled environment for the cleaning process. It also prevents the solvent from evaporating too quickly and ensures a uniform cleaning action.
Benefits of SIS Baths:
- High Cleaning Efficiency: The combination of the solvent and silicone oil provides a highly effective cleaning solution, removing even the most stubborn contaminants.
- Low Damage Potential: The silicone oil acts as a protective layer, minimizing the risk of damage to the wafer surface during the cleaning process.
- Environmentally Friendly: SIS baths use less solvent than traditional cleaning methods, reducing the environmental impact.
Applications of SIS Baths:
- Semiconductor Manufacturing: SIS baths are widely used in the fabrication of integrated circuits (ICs) and other semiconductor devices.
- Microelectronics: They are also employed in the cleaning of microelectronic components and devices.
Example:
A typical SIS bath might use a solvent like trichloroethylene (TCE) dissolved in a silicone oil with a specific viscosity. The wafer is immersed in the bath for a predetermined time, allowing the solvent to remove contaminants. The bath is then rinsed with a clean silicone oil to remove any remaining solvent and contaminants.
